Browsing Diffusion Data by Subject "Computational File Repository Categories::ALL CHEMICAL SYSTEMS::Al (Aluminum)"

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    • Annealing Kinetics of Voids and the Self-Diffusion Coefficient in Aluminum 

      Volin, T. E.; Balluffi, R. W. (2014-01-20)
      The annealing kinetics of voids in 99.9999 wt% pure aluminum were studied over the temperature range 85 to 209 °C in thin specimens by transmission electron microscopy. The isothermal shrinkage of individual voids was ...

    • Self-diffusion in aluminum at low temperatures 

      Burke, J.; Ramachandran, T. R. (2014-01-20)
      Values of the self-diffusivity of pure aluminum in the temperature range 130∮ to 200° have been determined by measuring the rate of annealing of prismatic and faulted dislocation loops in thin foils of quenched 99.999 pct ...