Browsing Diffusion Data by Subject "Computational File Repository Categories::EXPERIMENTAL TECHNIQUES::Microscopy::Transmission Electron"
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Annealing Kinetics of Voids and the Self-Diffusion Coefficient in Aluminum
(2014-01-20)The annealing kinetics of voids in 99.9999 wt% pure aluminum were studied over the temperature range 85 to 209 °C in thin specimens by transmission electron microscopy. The isothermal shrinkage of individual voids was ...